Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, In target

High pure metal sputtering target:
Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, In, Ag, Sn, graphite, Ta, Mo, Au, Hf, Mn, Zr, Mg, Zn, Pb, Ir, Y, Ce, La, Yb, Gd, pt Target
for the field of electrical and semiconductor devices, flat panel display, architectural and automotive glass, thin film solar cell, magnetic storage, instrument, decorate thin film, etc.

Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, In target