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Picture	Titel	Update
	High purity titanium,Ti granule, Ti target (CNM could provide high quality target material for the field of electrical and semiconductor devices, flat panel displa
	SiO2, SiO, high pure Silicon, Si target, Si coating material Oxide: SiO, SiO2, TiO2, ZrO2, HfO2, TiO, Ti3O5, Nb2O5, Ta2O5, Y2O3 etc. high purity Oxide coating materials.fluoride: Nb
	SiO, SiO2, TiO2, ZrO2, HfO2, TiO, Ti3O5 coatings SiO, SiO2, TiO2, ZrO2, HfO2, TiO, Ti3O5, Nb2O5, Ta2O5, Y2O3 etc. high purity Oxide coating materials.For complex film, c
	Ni-V Alloy target, Ni-Cr Alloy target, Si-Al Alloy target Ni-V Alloy target, Ni-Cr target, Ti-Al Alloy target, Si-Al Alloy target, Cu-Im Alloy target, Cu-Ga Alloy target, Cu-Im-G
	Ceramic Sputtering Target (CNM could provide high quality target material for the field of electrical and semiconductor devices, flat panel displa
	Thin Film Solar Industry Sputtering target (CNM could provide high quality target material for the field of electrical and semiconductor devices, flat panel displa
	Surface Engineering Sputtering Targets (CNM could provide high quality target material for the field of electrical and semiconductor devices, flat panel displa
	vacuum evaporation materials plate: complex film, color film, anti-reflection film, ultraviolet coating, air-sensitive sensor coating, high temperatu

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