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Picture	Titel	Update
	High density ceramic sputtering target (CNM could provide high quality target material for the field of electrical and semiconductor devices, flat panel displa
	High purity alloy sputtering target High purity alloy sputtering target: Ni-V Alloy target, Ni-Cr target, Ti-Al Alloy target, Si-Al Alloy target, Cu-Im Allo
	ITO target, AZO target,IGZO target High density ceramic sputtering target: ITO target, AZO target,IGZO target, MgO, Y2O3, Fe2O3,Ni2O3, Cr2O3, ZnO, ZnS, CdS
	Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, In target High pure metal sputtering target:Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, In, Ag, Sn, graphite, Ta, Mo, Au, Hf, Mn, Zr, Mg, Zn,
	Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, In, Ag High pure metal sputtering target:Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, In, Ag, Sn, graphite, Ta, Mo, Au, Hf, Mn, Zr, Mg, Zn,
	ZnS, ZnSe, TiN, SiC, LaTiO3, BaTiO3, SrTiO3, PrTiO3 ZnS, ZnSe, TiN, SiC, LaTiO3, BaTiO3, SrTiO3, PrTiO3,CdS etc. other compounds vacuum coating materials.For complex film,
	ITO target, AZO target,IGZO target, MgO, Y2O3 target High density ceramic sputtering target: ITO target, AZO target,IGZO target, MgO, Y2O3, Fe2O3,Ni2O3, Cr2O3, ZnO, ZnS, CdS
	Ni-V Alloy target, Ni-Cr target, Ti-Al Alloy target High pure alloy sputtering target: Ni-V Alloy target, Ni-Cr target, Ti-Al Alloy target, Si-Al Alloy target, Cu-Im Alloy

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